Industrial Vacuum Plasma Processing System is a device used for surface activation, surface cleaning, and deposition of a thin polymer layer with desired properties on different surfaces. Plasma processing by using this device is conducted in a controlled environment inside a sealed chamber, which is maintained at a medium vacuum through the introduction of selected gases. To do this, the surface is first cleaned and activated by the gas or mixture of gases which ionized by a radio frequency (RF) generator. Depending on the desired properties, then an appropriate monomer gas or liquid is pumped into the chamber where it is polymerized by a plasma to form a thin coating. The monomer is ionized by plasma excitation and its molecules break apart creating free electrons, ions, exited molecules and radicals. The radicals adsorb, condense, and polymerize on the surface. The electrons and ions crosslink, or create a chemical bond with the already deposited molecules, creating a harder and denser coating with a controllable thickness between 30 to 300 nm.