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Imec and Mitsui Chemicals Sign Agreement to Commercialize CNT Pellicle Technology for EUV Lithography

Imec and Mitsui Chemicals Sign Agreement to Commercialize CNT Pellicle Technology for EUV Lithography

Mitsui Chemicals will integrate imec’s fundamental CNT-based pellicle innovation into Mitsui Chemicals’ CNT pellicle technology to achieve full production specifications.
 

 January 29, 2024  Nano in the world


Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and Mitsui Chemicals, a leading Japanese chemical company and EUV pellicle supplier, announce the start of a strategic partnership on the commercialization of carbon-nanotube (CNT) based pellicles for extreme ultraviolet (EUV) lithography.

Under this partnership, Mitsui Chemicals will integrate imec’s fundamental CNT-based pellicle innovation into Mitsui Chemicals’ CNT pellicle technology to achieve full production specifications, targeting its introduction in high-power EUV systems in the 2025-2026 timeframe. The signing took place in Tokyo during Semicon Japan 2023.

The strategic partnership intends to develop the membrane and EUV pellicle jointly through consultation and EUV scanner validation by imec for commercialization at Mitsui Chemicals. These pellicles, designed to protect the photomask from contamination during EUV exposure, have extremely high EUV transmittance, very low EUV reflectance and minimal optical influence.

"Imec has a long history of supporting the semiconductor ecosystem to advance the lithography roadmap. Since 2015, we collaborated with partners throughout the supply chain to develop an innovative CNT-based pellicle design for advanced EUV lithography,” says Steven Scheer, Senior Vice President Advanced Patterning, Process and Materials at imec.

"We are confident that the in-depth knowledge we have on the metrology, characterization, properties and performance of CNT membranes will accelerate Mitsui Chemicals’ product development. Together, we hope to bring CNT pellicles into production for future generations of EUV lithography.”


 

Read the original article on Indian Chemical News.


 
 

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